Skip to main content

Chemical Vapor Deposition

3,304 Followers
Recent papers in Chemical Vapor Deposition
Nitrogen-doped diamond films selected-area deposition by the plasma-enhanced chemical vapor deposition process
CVD of Epitaxial SnO2 Films by the SnI4/O2 Precursor Combination
For Abstract see ChemInform Abstract in Full Text.
Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells
Transparent conducting ZnO:F was deposited as thin films on soda lime glass substrates by atmospheric pressure chemical vapor deposition (CVD) deposition at substrate temperatures of 480–500 °C. The precursors diethylzinc,... more
Iron filled carbon nanotubes grown on substrates with thin metal layers and their magnetic properties
Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor
A Route Towards Sustainability Through Engineered Polymeric Interfaces
Magnetic Properties of Single-Crystalline CoSi Nanowires
Parametric Modeling and Optimization of Chemical Vapor Deposition Process
Single-Crystal Germanium Growth on Amorphous Silicon
Latest achievements of CEA and AREVA NP on HTR fuel fabrication
Extensive research and development programs on the (Very) High Temperature gas cooled Reactor (V/HTR) are being conducted by many countries mainly promoted by the attractiveness of this concept and its capability for other applications... more
Quantifying the environmental footprint of semiconductor equipment using the environmental value systems analysis (EnV-S
Catalytic CVD production of carbon nanotubes using ethanol
Silicon nitride films by chemical vapor deposition in fluidized bed reactors at atmospheric pressure (AP/FBR-CVD)
Metal-catalyzed silicon nanowires: control and connection
Self-assembled Si nanowires can be grown using chemical vapor deposition accelerated by metal catalyst nanoparticles. The diameter of the nanowires depends on the size of the nanoparticles, which in turn can be controlled by varying the... more
A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches
Deposition of Niobium Nitride Thin Films from Tert -Butylamido- Tris -(Diethylamido)Niobium by a Modified Industrial MOCVD Reactor
Atomic Layer Deposition of SrTiO3 Thin Films from a Novel Strontium Precursor-Strontium-bis(tri-isopropyl cyclopentadienyl)
Highly Conformal Thin Films of Tungsten Nitride Prepared by Atomic Layer Deposition from a Novel Precursor
Featuring thin films. Handbook of Thin Film Process Technology. Edited byD. A. Glocker andS. I. Shah, Institute of Physics, Bristol 1995, XII, 798 pp., ring-bound softcover, £300, ISBN 0-7503-0311-5
Atomic Layer Deposition of Transparent VO x Thin Films for Resistive Switching Applications
W-gated trench power MOSFET (WFET)
ALD of YF 3 Thin Films from TiF 4 and Y(thd) 3 Precursors
Flexible binder-free silicon/silica/carbon nanofiber composites as anode for lithium–ion batteries
kimyasal buhar biriktirme
CVD Tanımı
CVD Çalışma Prensibi
CVD Reaksiyon Türleri
CVD Kullanım Alanları, Örnekleri, Avantajları ve Dezavantajları
CVD Çeşitleri
CVD ile ALD & PVD Farkları
THE SEVERAL FACTORS THAT AFFECT THE BUYING BEHAVIOR OF SOME VAPE USER AROUND METRO MANILA In Partial Fulfillment for the Subject Thesis Writing MARK 4113
CVD
CVD nedir,CVD yapilma yontemleri ,
yontemlerin farklari, avantajlari,PCV ve CVD farki
Machinability study of pure aluminium and Al–12% Si alloys against uncoated and coated carbide inserts
PRESIÓN DE VAPOR DE UN LÍQUIDO // VAPOR PRESSURE OF A LIQUID
En este experimento se determinó la presión de vapor de un líquido que en este caso fue el agua, utilizando la relación presión y temperatura. Se evalúo diferentes temperaturas para calcular la entalpía de vaporización del líquido usado a... more
Synthesis of graphitic carbon nitride by reaction of melamine and uric acid
Thermal Dissipation Efficiency in a MicroProcessor Using Carbon Nanotubes Based Composite
An updated overview of diamond-like carbon coating in tribology
Progress in Indium (III) Sulfide (In2S3) Buffer Layer Deposition Techniques for CIS, CIGS, and CdTe-based Thin Film Solar Cells
Recent progress with indium (III) sulfide (In2S3)-buffered thin film solar cells (TFSC) was briefly reviewed. In2S3 has emerged as a promising low-hazard buffer (or window) material, and has proven to improve the properties of the solar... more
Fluidized bed synthesis of carbon nanotubes – A review
Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: Trends in Deposition Techniques and Related Applications
This article provides an overview of the state-of-the-art chemistry and processing technologies for silicon nitride and silicon nitride-rich films, i.e., silicon nitride with C inclusion, both in hydrogenated (SiN x :H and SiN x :H(C))... more
Chemical vapor deposition of metals: Part 1. An overview of CVD processes
The chemical vapor deposition (CVD) of metals is a rapidly developing area in which metal-containing compounds are being synthesized as new precursors. This article reviews this area and discusses precursor design, reaction pathways,... more
Ferroelectric thin films for micro-sensors and actuators: a review
CVD Production of Doped Titanium Dioxide Thin Films
Boron-doped Homoepitaxial Diamond CVD from Microwave Plasma-Activated Ethanol/Trimethyl Borate/Hydrogen Mixtures
MOCVD and ALD of High-k Dielectric Oxides Using Alkoxide Precursors
Synthesis of multiwalled carbon nanotubes from bamboo charcoal and the roles of minerals on their growth
Open Access Journal
journal homepage:papers.itc.pw.edu.pl Numerical modeling of the CO2 desorption process coupled with phase transformation and heat transfer in a CCS installation
CVD of Al2O3 Thin Films Using Aluminum Tri-isopropoxide
A stagnation point cold-wall reactor was used for the CVD of corundum alumina (α-Al2O3) on metallic substrates. Depositions were carried out under low pressure using the thermally induced pyrolytic oxidation of aluminum tri-isopropoxide... more
Atomic Layer Deposition of WO3 Thin Films using W(CO)6 and O3 Precursors
Preparation of iron oxide nanoparticles supported on magnesium oxide for producing high-quality single-walled carbon nanotubes
Volatile Metal β-Diketonates: ALE and CVD precursors for electroluminescent device thin films
Synthesis of multiwalled carbon nanotubes supported on M/ MCM-41 (M = Ni, Co and Fe) mesoporous catalyst by chemical vapour deposition method
Aim of this research is to develop an effective way in producing multi-walled carbon nanotubes (MWNTs) via chemical vapour deposition method using acetylene as carbon source and synthesized mesoporous M/MCM-41 (M = Ni, Co and Fe) as... more
Photoelectrochemical properties of texture-controlled nanostructured α-Fe2O3 thin films prepared by AACVD
Nanostructured α-Fe2O3 thin film electrodes were deposited by aerosol-assisted chemical vapour deposition (AACVD) for photoelectrochemical (PEC) water splitting on conducting glass substrates using 0.1 M methanolic solution of Fe(acac)3.... more
Preparation and characterization of ZnS thin films by chemical bath deposition and electron-beam evaporation
Zinc sulphide thin films were prepared by chemical bath deposition (CBD) and the properties of these films are compared with those deposited by Physical vapour deposition (PVD). The variation in the optical and electrical properties of... more
Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films
Correlations in palladium membranes for hydrogen separation: A review