IOP PUBLISHING
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
doi:10.1088/0268-1242/22/5/015
Semicond. Sci. Technol. 22 (2007) 543–548
Scattering analysis of 2DEG carrier
extracted by QMSA in undoped
Al0.25Ga0.75N/GaN heterostructures
S B Lisesivdin1, S Acar1, M Kasap1, S Ozcelik1, S Gokden2
and E Ozbay3
1
Department of Physics, Gazi University, Ankara, Turkey
Department of Physics, Balikesir University, Balikesir, Turkey
3
Nanotechnology Research Center, Department of Physics, Department of
Electrical-Electronics Engineering, Bilkent University, Ankara, Turkey
2
E-mail: sblisesivdin@gmail.com
Received 10 December 2006, in final form 9 March 2007
Published 30 March 2007
Online at stacks.iop.org/SST/22/543
Abstract
Hall effect measurements on undoped Al0.25Ga0.75N/GaN heterostructures
grown by a metalorganic chemical vapour deposition (MOCVD) technique
have been carried out as a function of temperature (20–350 K) and magnetic
field (0–1.5 T). Magnetic field dependent Hall data were analysed using the
quantitative mobility spectrum analysis (QMSA) technique. The mobility
and density within the two-dimensional electron gas (2DEG) at the
Al0.25Ga0.75N/GaN interface and within the underlying GaN layer were
successfully separated by QMSA. Mobility analysis has been carried out
using both the measured Hall data at a single field and the extracted data
from QMSA. Analysis of the temperature-dependent mobility of 2DEG
extracted from QMSA indicates that the interface roughness and alloy
disorder scattering mechanisms are the dominant scattering mechanisms at
low temperatures while at high temperatures only polar optical phonon
scattering is the dominant mechanism. Al0.25Ga0.75N/GaN interface related
parameters such as well width, deformation potential constant and
correlation length were also accurately obtained from the fits of the simple
analytical expressions of scattering mechanisms to the 2DEG mobility.
1. Introduction
High electron mobility transistors (HEMTs) are widely
used and accepted as the promising components of the
high-speed electronics. HEMTs based on AlxGa1−xN/GaN
heterostructures are the most interesting candidate since their
description in 1993 [1] and demonstration of high-power
operability [2]. Due to their large bandgap energy, large
electron drift velocities, high conduction band discontinuity
and high thermal stability, AlxGa1−xN/GaN heterostructures
can operate at high power and high temperature conditions
with a 2DEG density and high mobility values as compared
even with GaAs-based devices [3–6].
Even without
an intentional doping, due to strong spontaneous and
piezoelectric polarizations at the AlxGa1−xN/GaN interface,
0268-1242/07/050543+06$30.00
© 2007 IOP Publishing Ltd
AlxGa1−xN/GaN heterostructures have 2DEG density with
high sheet carrier density values [7, 8]. Since the mobility and
density of the 2DEG in heterostructures are the key parameters
related to the device performance, a detailed study of these
parameters together with scattering mechanisms is of critical
importance for the device applications of AlxGa1−xN/GaN
heterostructures. The analyses of carrier transport properties
in AlxGa1−xN/GaN heterostructures have been reported in a
number of papers [9–12]. In the majority of cases, these
studies have been based on the analysis of the temperature
dependent single magnetic field Hall measurements. In the
mixed conduction (multi carriers) case, the standard resistivity
and Hall effect measurements at a single magnetic field are
of limited use because these measurements provide only
averaged values of mobility and carrier density. Therefore,
Printed in the UK
543
S B Lisesivdin et al
Table 1. Material constants used in scattering calculations [20, 32].
2.1. Polar optical phonon scattering
High frequency dielectric constant
Static dielectric constant
Electron effective mass
LO-phonon energy
LA-phonon velocity
Density of crystal
Electron wave vector
The electromechanical coupling
coefficient
LA elastic constant
TA elastic constant
Alloy mole fraction
Lattice constant in the (0 0 0 1)
direction
Volume of one atom
Alloy potential
At high temperatures, the mobility of a 2D carrier is mostly
limited by polar optic phonon scattering. The expression of
the mobility limited by the polar optic phonon scattering is
given by Ridley as [21]
ε∞ = 5.35
εs = 8.9
m∗ = 0.22m0
h̄ω = 0.092 eV
ul = 6.56 × 103 m s−1
ρ = 6.15 × 103 kg m−3
k = 7.3 × 108 m−1
K 2 = 0.039
cLA = 2.650 × 1011 N m−2
cTA = 0.442 × 1011 N m−2
x = 0.25
c = 5.185 × 10−10 m
−29
m−3
0 = 3.484 87 × 10
UAL = 2.36 × 10−19 V
µpo =
4πε0 εph̄2 h̄ω/kB T
[e
− 1],
eωm∗2 Z0
(1)
where
1
1
1
=
− .
εp
ε∞
εs
(2)
Here, h̄ω is the polar optic phonon energy, ε∞ and εs are
the high and low frequency dielectric constants, respectively.
m∗ is the effective mass.
2.2. Acoustic phonon scattering
single magnetic field Hall characterization is incapable of
providing precise determination of the transport properties
of AlxGa1−xN/GaN heterostructures since the charge carriers
in bulk GaN and AlxGa1−xN layer can also contribute to the
measurements in addition to the induced 2DEG by polarization
at the interface.
To extract the correct transport parameters of the
individual carriers in the multilayered semiconductor materials
such as AlxGa1−xN/GaN heterostructures, resistivity and Hall
effect measurements are to be performed as a function of
magnetic field. These measurements (variable field) allow the
densities and mobilities to be simultaneously characterized for
each of the multiple carrier species. Recently, the magnetic
field dependent Hall data have been analysed successfully
using QMSA technique, which is an effective technique
for determining individual carriers in the multilayered
semiconductors [13, 14]. Using the QMSA technique, the
mobilities and carrier densities of each electron and hole
species in bulk InN and GaN epilayers, and InP/InAlGaAs,
HgCdTe, AlGaAs/GaAs and AlGaN/GaN heterostructures
were investigated successfully by several groups [15–19].
In this work, firstly resistivity and Hall effect
measurements of Al0.25Ga0.75N/GaN heterostructures grown
by MOCVD technique have been carried out as a function
of temperature (20–350 K) and magnetic field (0–1.5 T).
To extract the individual mobilities and carrier densities of
Al0.25Ga0.75N/GaN heterostructures, the measurement results
were analysed using QMSA. Secondly, 2DEG mobility
analyses by taking into consideration the most relevant
scattering mechanisms are carried out using both the measured
Hall data and the extracted 2DEG data from QMSA. In both
cases, Al0.25Ga0.75N/GaN interface related parameters were
obtained and the differences between two cases were also
discussed.
2. Scattering mechanisms
Scattering mechanisms of two-dimensional (2D) carriers in
III–V heterojunctions are well described ([20], see references
therein).
The analytical expressions of the scattering
mechanisms used in our calculations are summarized below.
The material parameters used in the calculations are also listed
in table 1.
544
At intermediate temperatures, the acoustic phonon scattering
is another important scattering mechanism. In this work, we
use the elastic acoustic phonon scattering model proposed
by Ridley et al [22]. The acoustic phonon scattering
is calculated by considering two scattering mechanisms,
including deformation potential and piezoelectric scattering.
The mobility expression of deformation potential is given by
[22]
16ρeu2lh̄3
1
.
(3)
32 kB T m∗2 b JDP (k)
In equation (3), ρ is the crystal density, ul is the
longitudinal acoustic phonon velocity and is the deformation
potential. The factor b is called the Fang–Howard expression
[23] of wavefunctions for Hartree approximation of a
triangular well and is given by [24]
1/3
33e2 m∗ n2D
.
(4)
b=
8ε0 εsh̄2
In equation (3), JDP (k) is the integral
2k
1
4
(5)
JDP (k) =
q 2 q dq.
0
2πk 3 (q + qs )2 1 − 2k
µdp =
In this integral, qs is the two-dimensional reciprocal
screening length which is defined as
e2 m∗
F11 (q)f (0).
(6)
2πh̄2 ε0 εs
Here, f (0) is the occupation probability at the subband
edge, which can be assumed that all screening is determined
by the lowest subband electrons [22]. F11 (q) is the form factor
of the ground-state Fang–Howard wavefunction [23].
In strongly polar materials such as GaN the acoustic
phonons are strongly interacted by the piezoelectric effect.
The mobility expression of piezoelectric scattering with a
simplification of angular dependence is given by [22]
qs =
πε0 εsh̄3 k
1
.
(7)
2
∗2
eK kB T m JPE (k)
In equation (7), K is the electromechanical coupling
coefficient and given by [25]
µpe =
K2 =
2
ε2
εLA
− TA .
εs cLA
εs cTA
(8)
Scattering analysis of 2DEG extracted by QMSA in undoped Al0.25Ga0.75N/GaN
In equation (8), εLA , εTA , cLA , cTA are the effective
piezoelectric constants and the averaged elastic constants
related to longitudinal and transverse acoustic phonons,
respectively. The integral JPE (k) is in the form
2k
F11 (q)
3
(9)
JPE (k) =
q 2 q dq.
0
4k 2 (q + qs )2 1 − 2k
~
(a)
(b)
~
2.3. Alloy disorder scattering
It is well known that the investigated 2D carriers populate
near the AlxGa1−xN layer. The scattering of these electrons by
conduction band disorder is called alloy disorder scattering.
Kearley and Horrell [26] gave the mobility expression of alloy
disorder scattering without screening effects as
µalloy =
eh̄3
16
,
2
3b x(1 − x)m∗2 0 UAL
(10)
where x is the alloy mole fraction, 0 is the volume occupied
by one atom and UAL is the alloy potential.
2.4. Background impurity scattering
Impurity scatterings for 2DEG carriers can be investigated
in two parts; an ionized impurity scattering due to remote
donors which is effective in modulation-doped structures and
an ionized impurity scattering due to interface charges or
simply background impurity scattering which is effective in all
structures. In this work, because our samples are nominally
undoped, we only use the background impurity scattering as
an impurity scattering. The mobility of background impurity
scattering is given by [27]
8πh̄3 ε 2 kF2 IB (β)
,
(11)
e3 m∗2 NBI
where ε is the dielectric permittivity of GaN, and NBI is the 2D
impurity density due to background impurities. The integral
IB (β) is defined as
π
sin2 θ
IB (β) =
dθ ,
(12)
2
0 (sin θ + β)
where
µBI =
β = S0 /2kF .
(13)
In equation (13), kF is the wavevector on the Fermi
surface, and S0 is the screening constant which is given for
the degenerate case by Lee et al as [28]
S0 =
e2 m∗
.
2πεh̄2
(14)
2.5. Interface roughness scattering
Interface roughness is an important problem for semiconductor
heterostructures [20]. Interface roughness can lead to the
perturbation of electron energy [29]. Narrow quantum wells
of AlxGa1−xN/GaN heterostructures are more sensitive to
interface roughness that can lead to a large fluctuation in the
quantized electron energies [30]. The mobility of interface
roughness scattering is given by [20]
2ε0 εs 2 h̄3
1
,
(15)
µIFR =
n2D
e3 m∗2 JIFR (k)
Figure 1. (a) Layer structure of Al0.25Ga0.75N/GaN heterostructures
sample that used in study. (b) Band structure of the sample. 2DEG
is shown in detail in the inlet.
where
is the lateral size of the roughness and
is the
correlation length between fluctuations. The integral JIFR (k)
in equation (15) is defined as
2k
2 2
e−q /4
4
JIFR (k) =
(16)
q 2 q dq,
0
3
2
2k (q + qs ) 1 − 2k
where qs is the screening constant and given by [30]
e2 m∗
F (q).
(17)
2πh̄2 ε0 εs
The form factor F (q) in equation (17) is given by [31]
∞ ∞
′
F (q) =
dz
dz′ [f (z)]2 [f (z′ )]2 e−q|z−z | .
(18)
qs =
0
0
3. Experimental techniques
The sample investigated in this work was grown on a c-plane
(0 0 0 1) sapphire (Al2O3) substrate in a low-pressure MOCVD
reactor. Prior to epilayer growth, the sapphire substrate was
cleaned in H2 ambient at 1100 ◦ C, and then a 25 nm thick
low temperature (LT) GaN nucleation layer was grown at
500 ◦ C. The reactor pressure was set to 50 mbar during the
substrate cleaning and nucleation growth. After the deposition
of the LT-GaN nucleation layer, the wafers were heated to a
high temperature for annealing. For the sample, the two-step
growth process was applied with the ramp time 2.5 min, and
the annealing temperature 1100 ◦ C. Approximately, a 2.5 µm
thick GaN layer was deposited on the annealed nucleation
layers using constant growth conditions. Finally, a 25 nm
thick Al0.25Ga0.75N with 3 nm GaN cap layers was grown. All
layers are nominally undoped. The details of the samples are
given in figure 1.
For the resistivity and Hall effect measurements by the
van der Pauw method, square-shaped (5 × 5 mm2) samples
have been prepared with Ti/Al/Ni/Au evaporated dot contacts
in the corners. Current was kept low to maintain ohmic
behaviour, so the 2D electrons were in thermal equilibrium
with the lattice. Current independence of mobility and the
carrier density has been confirmed in the current interval
of 1–500 µA. The measurements have been made over a
545
S B Lisesivdin et al
(a)
Figure 2. Experimental Hall mobility and sheet carrier density in
undoped Al0.25Ga0.75N/GaN.
(b)
temperature range 20–350 K using a Lakeshore Hall effect
measurement system (HMS). At each temperature step, the
Hall coefficient and resistivity have been measured for both
current directions, both magnetic field polarization, and all
possible contact configurations at 31 magnetic field steps
between 0 and 1.5 T. The magnetic field dependent data have
been analysed using QMSA software provided by Lakeshore.
4. Experimental results and analysis
4.1. Experimental results and quantitative mobility
spectrum analysis
Resistivity
and
Hall
effect
measurements
of
Al0.25Ga0.75N/GaN heterostructures have been carried
out as a function of temperature (20–350 K) and magnetic
field (0–1.5 T). Figure 2 shows the temperature dependence
of the sheet carrier density and Hall mobility at 0.5 T in
the temperature range of 20–350 K. At high temperatures,
the mobility sharply decreases with increasing temperature
while it is independent of temperature at low temperatures
(below 100 K). The sheet carrier density can be accepted as
temperature independent. These behaviours of sheet carrier
density and mobility are typical of 2DEG structures. Above
100 K, Hall mobility decreases with increasing temperature
with a temperature dependence of ∼T −3/2 , which is a typical
temperature dependence of phonon scattering mobility. The
sheet carrier density still tends to be a constant, which is
a further confirmation of the existence of 2DEG even at
high temperatures. At room temperature, Hall mobility and
sheet carrier density of the sample are 850 cm2 V−1 s−1 and
1.44 × 1013 cm−2, respectively. At 20 K, electron mobility
is as high as 3013 cm2 V−1 s−1. In the nominally undoped
AlxGa1−xN/GaN heterostructures, such a high value of sheet
carrier densities is due to the spontaneous and piezoelectric
polarization fields [33, 34].
Magnetic field dependent Hall data taken at a temperature
range of 20–350 K are analysed by using QMSA technique. A
detailed QMSA analysis of Al0.25GaN0.75/GaN heterostructure
was given in our previous work [35]. Figures 3(a) and (b) show
the QMSA results as a function of temperature for the mobility
and the integrated density for the studied sample. From
546
Figure 3. (a) Mobility versus temperature. The circle represents
measured mobility. The triangle and square represent mobilities
obtained from QMSA. (b) Sheet carrier density versus inverse
temperature. The circle represents measured sheet density. The
triangle and square represent the 2DEG and minority carrier
densities obtained from QMSA, respectively. Lines show the
proposed trends of the 2DEG and minority carriers.
figure 3(b), it can be clearly understood that both polarizationinduced 2DEG density (denoted with triangles) and thermally
activated carriers (denoted with squares) contribute to the
measured carrier density. At low temperatures, the extracted
2DEG mobility is slightly higher than the measured mobility.
Below 100 K, the 2DEG mobility is temperature independent.
Above 100 K, the 2DEG mobility is limited by lattice
scattering mechanisms, which will be analysed in the next
section. The extracted 2DEG density is independent of
temperature at the whole studied temperature range, as is
expected. Its proposed trend with temperature is shown by
the solid line in figure 3(b). On the other hand, at the whole
studied temperature range, the extracted 2DEG density is also
lower than the measured sheet carrier density. The mobilities
and densities of the minority carriers are highly temperature
dependent. The thermally activated minority carriers (with
activation energies of 58 and 218 meV) are originated from
the donor levels of bulk GaN [13, 35].
4.2. Mobility analysis
In this section the mobilities limited by the individual
scattering mechanisms, polar optical phonon, acoustic phonon,
Scattering analysis of 2DEG extracted by QMSA in undoped Al0.25Ga0.75N/GaN
(a)
(b)
Figure 4. (a) Measured and calculated (using the measured Hall
data) mobility versus temperature. (b) Extracted and calculated
(using the extracted 2DEG density and mobility) mobility versus
temperature.
alloy disorder, background impurity and interface roughness
scatterings have been calculated from the expressions given in
section 2 using the material parameters given in table 1. In
the calculation, the background impurity (nimp) and lateral size
( ) were taken as 10−23 m−3 [36] and 2 × 2.58 × 10−10 m
(for two monolayers) [32], respectively. The other parameters
such as well width (Z0), deformation potential constant ()
and correlation length ( ) were used as adjustable parameters.
Using the Mattheisen rule, the total mobility is then calculated
as the combination of individual mobilities.
Firstly, we carried out the fit of the scattering expressions
to the experimental mobility using the measured sheet carrier
density taken at 0.5 T, as the usual approach. The calculated
individual mobilities and the total mobility are given in
figure 4(a). It can be seen from figure 4(a) that the total
mobility fits quite well to the experimental data, taken at 0.5 T,
using a well width of Z0 = 4 nm, a deformation potential
constant of = 12.5 eV and a correlation length of
=
17.5 nm (corresponds to approximately 55 atomic spacing).
In general, the single field Hall effect data are widely
used in the scattering analysis. However, since the single field
Hall effect measurements provide only a weighted average
of the mobility and carrier density, an accurate scattering
analysis can only be carried out in the case of single carrier
conduction. If the structure contains multiple carriers such
as in AlxGa1−xN/GaN heterostructures, the single field Hall
effect measurements would not lead to identify the correct
transport parameters of the individual carriers. Secondly,
the above calculations were, therefore, repeated using the
extracted 2DEG mobility and 2DEG density from QMSA.
The results are given in figure 4(b). A good agreement with
the extracted 2DEG mobility is obtained using the fitting
parameters as the well width of Z0 = 7.5 nm, the deformation
potential constant of = 8 eV and the correlation length
of
= 9.5 nm (corresponds to approximately 30 atomic
spacing).
The fitting parameters of the 2DEG obtained from the
scattering analysis using the data extracted from QMSA show
significant differences from that of the obtained from the single
field Hall data. The former analysis has a smaller well width,
a higher deformation potential value and a higher correlation
length. Since the second analysis has been based on only the
2DEG mobility and density without the effects of the other
carriers, the calculated parameters can be considered as more
accurate parameters representing the real sample figures. It can
be seen from figures 4(a) and (b) that the values of calculated
individual mobility are also considerably different than that
of the obtained from the single field Hall data. This indicates
that any conclusion drawn from single field Hall measurements
may be highly misleading.
Considering the results (according to figure 4(b)), we
conclude: (i) the low-temperature mobility is dominated by
interface roughness and alloy disorder scattering mechanisms,
and the background impurity scattering has also a considerable
influence on the 2DEG formed at the interface in
undoped Al0.25Ga0.75N/GaN heterostructures. (ii) At high
temperatures, the optical phonon scattering is the dominant
mechanism, and the effects of interface roughness and alloy
disorder scattering mechanisms have only small contribution
to the mobility of 2DEG. It is interesting to note that our
analyses show the acoustic phonon scattering has a negligible
effect on the 2DEG mobility. However, the acoustic phonon
scattering mechanism is, in general, found as a main scattering
mechanism at intermediate temperature [37–39]. (iii) For
Al0.25Ga0.75N/GaN heterostructures, the well width of Z0 =
7.5 nm, the deformation potential constant of = 8 eV and
the correlation length of
= 9.5 nm are obtained. These
values are superior to the single-field measurement analysis
results when compared with the Fermi wavelength well-width
approximation [40] and the Hsu et al calculation for the
deformation potential [9].
5. Conclusions
Hall effect measurements on undoped Al0.25Ga0.75N/GaN
heterostructures grown by MOCVD have been carried out
as a function of temperature (20–350 K) and magnetic field
(0–1.5 T). Magnetic field dependent Hall data were analysed
using QMSA technique. QMSA successfully separated
electrons in the 2DEG at the Al0.25Ga0.75N/GaN interface
and electrons in the bulk GaN layer which contribute to the
measurements in addition to the 2DEG at high temperatures.
The mobility analysis has been carried out both using the
measured Hall data at a single field (B = 0.5 T) and the
547
S B Lisesivdin et al
data extracted from QMSA. The scattering analysis based
on the extracted mobility and density of 2DEG formed at
an Al0.25Ga0.75N/GaN heterointerface shows that the interface
roughness and alloy disorder scattering mechanisms are the
dominant scattering mechanisms at low temperatures while at
high temperatures only the polar optical phonon scattering
is the dominant mechanism. The values of well width,
deformation potential and correlation length were found as
7.5 nm, 8 eV and 9.5 nm, respectively.
Finally, it
can be concluded that any conclusion drawn from single
field Hall data or from any analysis based on single
field Hall measurements would be highly misleading not
only for AlxGa1−xN/GaN heterostructures but also for any
semiconductor structures with multicarrier conduction.
Acknowledgments
This work is supported by the State of Planning Organization
of Turkey under grant no. 2001K120590, and by TUBITAK
under project nos. 104E090, 105E066, 105A005. One of the
authors (Ekmel Ozbay) acknowledges partial support from the
Turkish Academy of Sciences.
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