This strongly interdisciplinary consortium targets the development of strategies for the preparation of nanostructures in the 5-100 nm resolution range that is currently inaccessible with existing lithographic and micromachining technologies.

It will focus on the development of generic methods that are applicable in a wide range of materials and on various substrates. Such strategies will allow the development of new efficient technologies for industrial nanofabrication processes with sub-100 nm resolution. The strength of the consortium is that it will bring together expertise in top-down as well as bottom-up methodologies for nanostructure preparation. The main emphasis of the consortium will therefore be to combine these methodologies in novel patterning strategies. The focus will be on three main lines of research, each represented in a cluster.

The aim of the first cluster is to realize fabrication techniques for large-scale periodic structures (gratings, arrays etc.), applicable in data storage, bio-filters, photonic structures, quantum dot arrays and test structures for wafer steppers and mastering equipment. The second focuses in particular on the combination of top-down and bottom-up approaches to explore the governing principles of surface patterning and functionalization for new areas of application. In the third cluster the aim is on the fabrication of arbitrary patterns by the use of optical technologies (top-down) and self-assembly strategies (bottom-up). The nanopatterned structures accessed in this project find application in high-density data storage, (bio)sensors, and photonic and electronic devices.

Flagshipcaptain:
Prof. dr. ir. J. Huskens
Universiteit Twente
MESA+ Research Institute for Nanotechnology
Supramolecular Chemistry & Technology (SMCT)